发明名称 |
METHOD AND APPARATUS FOR EVALUATING WAVEFRONT ABERRATION |
摘要 |
PROBLEM TO BE SOLVED: To reduce the time required for the evaluation of wavefront aberrations in a method and an apparatus for evaluating wavefront aberrations. SOLUTION: The wavefront aberration evaluation method comprises a process (a) for forming interference fringes by superposing a first light on a second light of which at least either one contains wavefront aberrations of an optical system; a process (b) for changing the phase difference between the phase of the first light and the phase of the second light until the difference between a minimum phase difference and a maximum phase difference exceeds at least (2π/n)×(n+1) at prescribed phase intervals of 2π/n (wherein, n is an integer equal to 2 or greater); a process (c) for imaging interference fringe images at the prescribed phase intervals; a process (d) for producing a plurality of groups of images comprising a plurality of interference fringe images continuous at the prescribed phase intervals; a process (e) for determining wavefront aberrations on the basis of the plurality of images contained in the groups of images on each of the plurality of groups of images; and a process (f) for evaluating the wavefront aberrations of the optical system by averaging a plurality of wavefront aberrations determined on the plurality of groups of images. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2005345105(A) |
申请公布日期 |
2005.12.15 |
申请号 |
JP20040161343 |
申请日期 |
2004.05.31 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
TAKADA KAZUMASA;FURUTA HIROKAZU;UTSURO HIDETOSHI;ITO MASAYA |
分类号 |
G01J9/02;G01M11/02;(IPC1-7):G01M11/02 |
主分类号 |
G01J9/02 |
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