| 摘要 |
Methods and apparatus for reducing particle contamination on a reticle used in an extreme ultraviolet (EUV) lithography process. According to one aspect of the present invention, an apparatus that protects a surface of an object includes a plate that is positioned in proximity to the surface and protects at least a first portion of the surface. An opening is defined within the plate, and is such that a second portion of the surface is exposed through the opening. The apparatus also includes at least one magnetic component which creates a static magnetic field that is arranged to deflect charged particles away from the opening and the surface of the object.
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