发明名称 Retaining ring assembly for use in chemical mechanical polishing
摘要 A retaining ring assembly for use in chemical mechanical polishing that includes an annular plastic retaining ring portion defining an annular projection thereon, an annular metal backing defining an annular channel therein for receiving the projection and a pair of elongated spring members concentrically disposed about the annular projection on the retaining ring. The channel in the backing is sized so as to receive the annular projection on the retaining ring and spring members therein upon the retaining ring being urged against the backing whereupon the spring members bear against the projection on the retaining ring and portions of the annular backing so as to releasably secure the retaining ring to the backing such that the retaining ring can be replaced upon becoming worn during use and the metal backing can be reused.
申请公布号 US2005277375(A1) 申请公布日期 2005.12.15
申请号 US20040865626 申请日期 2004.06.10
申请人 YOUNG RICHARD T 发明人 YOUNG RICHARD T.
分类号 B24B1/00;B24B37/04;(IPC1-7):B24B1/00 主分类号 B24B1/00
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