WATER-REPELLENT COMPOSITION, WATER-REPELLENT THIN FILM, AND THIN FILM WITH WATER-REPELLENT/HYDROPHILIC PATTERN

摘要

A water-repellent composition from which a thin film having a water-repellent/hydrophilic pattern can be easily formed with the aid of a light having relatively low energy. The water-repellent composition comprises a water-repellent compound (A) which decomposes by the action of an acid to come to have reduced water repellency (e.g., R<f2>OCOR<3>Si(R<4>)3-mX<2>m, wherein R<f2> is monovalent polyfluoroalkyl, R<3> is alkylene, R<4> is methyl, X is a hydrolyzable group, and m is an integer of 1-3) and a compound (B) which decomposes upon irradiation with a light having a wavelength of 200 nm or longer to generate an acid. A thin film formed from the composition is irradiated with a light to form a thin film having a water-repellent/hydrophilic pattern.