发明名称 VACUUM SPUTTERING CATHODE
摘要 The invention relates to a vacuum sputtering cathode comprising a target support (2) consisting of a cooler. The inventive cathode is characterised in that it comprises a support base (3) on which a frame (11) is disposed, said frame defining at least one cavity (1a) for the circulation of a coolant. According to the invention, a membrane (4) is disposed on top of the frame (11), said base (3), frame (11) and membrane (4) being assembled at the periphery thereof.
申请公布号 WO2004008479(A3) 申请公布日期 2005.12.15
申请号 WO2003FR02111 申请日期 2003.07.08
申请人 TECMACHINE;AULAGNER, MICHEL;LABALME, LIONEL 发明人 AULAGNER, MICHEL;LABALME, LIONEL
分类号 C23C14/34;H01J37/34 主分类号 C23C14/34
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