发明名称 |
VACUUM SPUTTERING CATHODE |
摘要 |
The invention relates to a vacuum sputtering cathode comprising a target support (2) consisting of a cooler. The inventive cathode is characterised in that it comprises a support base (3) on which a frame (11) is disposed, said frame defining at least one cavity (1a) for the circulation of a coolant. According to the invention, a membrane (4) is disposed on top of the frame (11), said base (3), frame (11) and membrane (4) being assembled at the periphery thereof. |
申请公布号 |
WO2004008479(A3) |
申请公布日期 |
2005.12.15 |
申请号 |
WO2003FR02111 |
申请日期 |
2003.07.08 |
申请人 |
TECMACHINE;AULAGNER, MICHEL;LABALME, LIONEL |
发明人 |
AULAGNER, MICHEL;LABALME, LIONEL |
分类号 |
C23C14/34;H01J37/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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