发明名称 VERFAHREN ZUM HERSTELLEN VON LÖCHERN IN EINER MEHRLAGENLEITERPLATTE
摘要 Multilayered conductor plate (1) comprises at least two copper layers (2, 3) separated by a dielectric layer (4). The first copper layer forming the outer side of the conductor plate is provided with a coating (5) whose CO2 laser irradiation absorption is greater than the CO2 laser irradiation absorption of the outer side of the first copper layer, or with a surface structure increasing the CO2 laser irradiation absorption. An Independent claim is also included for a process for producing holes (7) in the copper layer forming the outer side of the above multilayered conductor plate and in a dielectric layer using laser irradiation. The coating is an organometallic coating.
申请公布号 AT311736(T) 申请公布日期 2005.12.15
申请号 AT20010121061T 申请日期 2001.09.01
申请人 TRUMPF LASERTECHNIK GMBH 发明人 SCHWANDT, MARKUS;MUELLERSCHOEN, OLIVER
分类号 B23K26/18;H05K3/00;H05K3/38;(IPC1-7):H05K3/00;H05K3/46 主分类号 B23K26/18
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