| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography, including a light weight carriage for a lithographic device with a large rigidity and having full cooling characteristics and arranging characteristics. <P>SOLUTION: There is provided a lithographic device, having a lighting system for adjusting a radiation beam, an article support member for supporting an article placed in the beam path of the radiation beam, and a lithography device having a movable carriage for moving the article support member. The carriage includes a compartmented compound structure, having a non-compound mounting interface and/or cooling interface. With this structure, for example, interface using metal or ceramic materials can be used in combination with an advantage of the compound structure, such as low specific gravity and high Young's modulus at a position and in a direction requiring high strength and high stability and high electrical resistance. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
