| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and an apparatus for generating exposure data whereby dispersion in number of shots of each of unit regions with a plurality of a charged particle beams simultaneously exposed can be averaged and exposure with a high throughput can be attained. <P>SOLUTION: Layout data 10 are extracted as a plurality of partial package patterns 12, and when the number of kinds of the extracted plural partial package patterns 12 exceeds a prescribed permissible number, the partial package patterns 12a with lowest effectiveness for partial package exposure are selected among the partial package patterns 12 included in the unit regions 20a with a least calculated number of shots, and the partial package patterns 12a are sequentially deleted from all the unit regions. Since variable rectangular exposure is applied to the deleted partial package patterns 12a, the dispersion in number of shots of each of unit regions with a plurality of a charged particle beams simultaneously exposed can be averaged on a semiconductor substrate (or reticle) 20. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
