| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a display apparatus and an apparatus of the method, by which a desired pattern can be exposed with high resolution in a short time by a direct exposure method that uses a spatial optical modulator. <P>SOLUTION: The method is carried out by using a direct aligner having a light source 1 and a spatial optical modulator 4 having a large number of micro reflecting mirrors, whose inclination of the reflecting plane is independently controllable, arranged in a two-dimensional arrangement plane in xy directions. When a resist film formed on a substrate to constitute a display apparatus is to be exposed by irradiation with light from the light source 1 by reflecting the light on a pattern comprising a large number of spots formed on the two dimensional arrangement of the micro reflecting mirrors, the light from the light source 1 is converged to enter the center portion of each micro reflecting mirror and the two-dimensional arrangement plane of the spatial optical modulator 4 is oscillated by velocity modulation in the xy directions during exposure so as to irradiate the resist film 8, formed on the substrate 7 with the spot pattern as a pattern having continuing spots which constitute the pattern. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
