发明名称 CARRIER MEMBER WITH CLEANING FUNCTION, AND METHOD FOR CLEANING SUBSTRATE TREATMENT APPARATUS USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a carrier member with a cleaning function for substrate treatment apparatuses, which hate foreign substances, such as production apparatuses and inspection apparatuses for semiconductors, flat panel displays, printed boards and the like. SOLUTION: This carrier member with cleaning function is a carrier member for removing foreign substances by transfer into a substrate treatment apparatus and is characterized by comprising a cleaning layer formed of a material having a surface free energy of 15 to 30 mJ/m<SP>2</SP>and an angle of contact with water of more than 90 degrees provided on the carrier member. In particular, in the above construction, a cleaning layer is provided directly on the carrier member. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005342720(A) 申请公布日期 2005.12.15
申请号 JP20050242841 申请日期 2005.08.24
申请人 NITTO DENKO CORP 发明人 TERADA YOSHIO;NAMIKAWA AKIRA
分类号 B08B1/00;H01L21/304;H01L21/677;H01L21/68;(IPC1-7):B08B1/00 主分类号 B08B1/00
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