发明名称 |
Semiconductor device with scattering bars adjacent conductive lines |
摘要 |
A semiconductor device and method of manufacture thereof wherein scattering bars are disposed on both sides of an isolated conductive line of a semiconductor device to improve the lithography results. The scattering bars have a sufficient width and are spaced a sufficient distance from the isolated conductive line so as to increase the depth of focus of the isolated conductive line during the patterning of the semiconductor device. The scattering bars are left remaining in the finished semiconductor device after the manufacturing process is completed.
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申请公布号 |
US2005277067(A1) |
申请公布日期 |
2005.12.15 |
申请号 |
US20040867076 |
申请日期 |
2004.06.14 |
申请人 |
CHEN KUEI SHUN;LIN CHIN-HSIANG;YEN YUNG-SUNG;LAI CHIH-MING |
发明人 |
CHEN KUEI SHUN;LIN CHIN-HSIANG;YEN YUNG-SUNG;LAI CHIH-MING |
分类号 |
G03F7/00;H01L21/311;H01L21/768;(IPC1-7):G03F7/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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地址 |
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