| 发明名称 |
Photomask reticle having multiple versions of the same mask pattern with different biases |
| 摘要 |
A reticle includes at least two duplicate mask patterns each having a different bias. A reticle according to at least one embodiment of the invention includes a first mask pattern, a second mask pattern and a third mask pattern, each of the first mask pattern, second mask pattern and third mask pattern being duplicates of one another and having a different bias.
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| 申请公布号 |
US2005277032(A1) |
申请公布日期 |
2005.12.15 |
| 申请号 |
US20040866976 |
申请日期 |
2004.06.14 |
| 申请人 |
PHOTRONICS, INC. 15 SECOR ROAD P.O. BOX 5226 BROOKFIELD, CONNECTICUT 06804 |
发明人 |
ROCKWELL BARRY K.;TRACY JEFFREY W.;VOKOUN EDWARD R. |
| 分类号 |
G03C5/00;G03F1/00;(IPC1-7):G03F1/00 |
主分类号 |
G03C5/00 |
| 代理机构 |
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