发明名称 PHOTOLITHOGRAPHY SYSTEM
摘要 PROBLEM TO BE SOLVED: To mount a substrate in a correct placing manner by easily confirming a drawing pattern without performing complicated work with respect to an operator of photolithography equipment located in a location distant from a pattern data listing device. SOLUTION: In a photolithography system comprising a host computer 10, a drawing controller 20, and photolithography equipment 30, the host computer 10 converts drawing pattern data, vector data such as CAD data or the like, into image data, and transmits the image data with pattern data to the drawing controller 20 arranged in a distant place. The drawing controller 20 displays a pattern image to monitors 20A, 40 on the basis of the image data transmitted. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005347658(A) 申请公布日期 2005.12.15
申请号 JP20040168055 申请日期 2004.06.07
申请人 PENTAX CORP 发明人 INOMATA TOSHINORI
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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