发明名称 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a compound and a radiation-sensitive composition which respond to radiation of excimer laser light, such as KrF, extreme UV rays, electron beams, X rays or the like, and to provide a non-polymer radiation-sensitive composition showing high sensitivity, high resolution, high heat resistance, high etching durability and solvent solubility in a simple manufacturing process, without using metal catalysts. <P>SOLUTION: The radiation-sensitive composition contains 1 to 80 wt.% of a solid component and 20 to 99 wt.% of solvent, and contains a compound (B) satisfying specified conditions. The sum of the compound (B) and a solubility accelerator is 50 to 99.999 wt.%, with respect to the total weight of the solid component. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005346024(A) 申请公布日期 2005.12.15
申请号 JP20040249954 申请日期 2004.08.30
申请人 MITSUBISHI GAS CHEM CO INC 发明人 OGURO MASARU;ECHIGO MASATOSHI
分类号 G03F7/004;G03F7/039;H01L21/027 主分类号 G03F7/004
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