发明名称 METHOD OF MANUFACTURING IMAGE DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a image display device which is provided with an active matrix substrate, having highly efficient thin-film transistor circuit which operates at a high-speed mobility in a drive circuit for driving a pixel portion arranged into a matrix form. SOLUTION: A pulse modulation laser beam or a pseudo CW laser beam is scanned and irradiated to a polysilicon film, which is formed in a drive circuit region DAR1 around a picture element region PAR of an active matrix substrate SUB 1 so that a discontinuous modify region of approximately strip-shaped crystal silicon film, which is modified so as to have grain boundary which is continuous in the scanning direction, is formed. The drive circuit which has an active element, such as a thin-film transistor is fabricated so that the channel direction become the crystal growth direction of approximately strip-shaped crystal silicon film to a virtual tile TL which is formed in the discontinuous modify region. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005347764(A) 申请公布日期 2005.12.15
申请号 JP20050208022 申请日期 2005.07.19
申请人 HITACHI LTD 发明人 HATANO MUTSUKO;YAMAGUCHI SHINYA;SHIBA TAKEO;TAI MITSUHARU;AKIMOTO HAJIME
分类号 H01L21/20;H01L21/268;H01L21/336;H01L29/786;(IPC1-7):H01L21/20 主分类号 H01L21/20
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