| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processor that accurately controls the temperature of a semiconductor substrate and forms a film, having an accurate thickness on the semiconductor substrate. SOLUTION: A control program corrects an interference matrix using the least square method or exponentially-weighted recurrence least-square algorithm. The control program corrects the interference matrix using variation U of a temperature setting value and variation Y of a temperature measurement value by temperature control of a control computer. The newly calculated interference matrix is stored in the matrix DB, and used for next or later temperature control. COPYRIGHT: (C)2006,JPO&NCIPI
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