Pollutant removal method and apparatus, and exposure method and apparatus

摘要

A method for quickly removing pollutants adhered to a predetermined optical member in an optical system. To remove the pollutants adhered to a lens ( 32 A) disposed at the upper end of a projection optical system (PL), a cylindrical protecting member ( 53 ) is disposed through the openings in a reticle stage ( 22 ) and a reticle base ( 23 ). The bottom surface of a support section ( 56 ) at the tip section of a rod section ( 58 ) is brought into contact with the surface of the lens ( 32 A) through the inner surface of the protecting member ( 53 ). A wiping cloth soaked with a washing solution containing hydrofluoric acid is attached to the bottom surface of the support section ( 56 ). The support section ( 56 ) is reciprocated via the rod section ( 58 ) to remove the pollutants on the lens ( 32 A) with the wiping cloth.