| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an aligner capable of obtaining high exposure accuracy and measurement accuracy by excellently implementing liquid feed operation and liquid recovering operation for forming a liquid immersion region and forming the liquid immersion region into a desired state. <P>SOLUTION: The aligner exposes a substrate P via a projection optical system PL and liquid. The aligner is provided in the vicinity of an image plane side of the projection optical system PL, and includes a nozzle member 70 having openings 12, 22, 32, 62 through which liquid flows. The nozzle member 70 is a laminate formed by laminating a plurality of members 71, 72, 73, and at least one member 72 of the plurality of the members 71, 72, 73 includes porous structure regions 74, 75 in which a plurality of holes are formed. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
