发明名称 |
TARGET MATERIAL AND ITS USE IN A SPUTTER PROCESS |
摘要 |
The invention relates to a target material for the production of a protective layer for a solar control and absorption layer by means of sputtering. This target material is comprised of silicon doped with titanium. The protective layer, which can be produced with the target material, is heatable without significant changes of its properties. It is therefore also suitable for coating lass, which is heated and subsequently bent. |
申请公布号 |
WO2005118906(A1) |
申请公布日期 |
2005.12.15 |
申请号 |
WO2004EP05923 |
申请日期 |
2004.06.02 |
申请人 |
APPLIED FILMS GMBH & CO. KG;KLEIDEITER, GERD;ZMELTY, ANTON;GEISLER, MICHAEL |
发明人 |
KLEIDEITER, GERD;ZMELTY, ANTON;GEISLER, MICHAEL |
分类号 |
C03C17/34;C03C17/36;C23C14/06;C23C14/34;C23C14/35 |
主分类号 |
C03C17/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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