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发明名称
An apparatus for fabricating a semiconductor device and a method for fabricating a polysilicon film using the same
摘要
申请公布号
EP0902459(B1)
申请公布日期
2005.12.14
申请号
EP19970307010
申请日期
1997.09.10
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
PARK, YOUNG-WOOK;YOO, CHA-YOUNG;KIM, YOUNG-SUN;NAM, SEUNG-HEE
分类号
H01L21/00;H01L21/02;(IPC1-7):H01L21/00
主分类号
H01L21/00
代理机构
代理人
主权项
地址
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