| 摘要 |
A method of washing an array substrate (126;202) is disclosed. The method includes contacting the array substrate (126;202) with a first wash solution and triggering an automatic wash process. The automatic wash process includes a) separating the array substrate (126,202) from the first wash solution, b) contacting the array substrate (126;202) with a second wash solution, c) incubating the array substrate (126;202) in the second wash solution under controlled conditions, d) separating the array substrate (126;202) from the second wash solution, e) contacting the array substrate (126;202) with a third wash solution, and f) separating the array substrate (126;202) from the third wash solution. |
