METHOD OF GAP-FILL USING A HIGH DENSITY PLASMA DEPOSISION,申请号KR20030056637-传众专利搜索

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发明名称	METHOD OF GAP-FILL USING A HIGH DENSITY PLASMA DEPOSISION
摘要
申请公布号	KR100536604(B1)	申请公布日期	2005.12.14
申请号	KR20030056637	申请日期	2003.08.14
申请人		发明人
分类号	C23C14/32;H01L21/762;H01L21/768;(IPC1-7):C23C14/32	主分类号	C23C14/32
代理机构		代理人
主权项
地址

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