| 摘要 |
A system for fabricating Bragg gratings includes an optical waveguide (e.g., an optical fiber, a planar waveguide), an interference pattern generator (e.g., a transmission phase grating such as a phase mask or a diffraction grating), first motion equipment (e.g. a nanostage), a pulsed light source (e.g. an excimer laser), and second motion equipment (e.g. a stepper motor). A method for fabricating Bragg gratings using this system includes providing relative motion between the optical waveguide and the interference pattern using the nanostage, providing relative motion in discrete increments between the pulsed light source and the assemblage comprising the optical waveguide, nanostage, and interference pattern generator using the stepper motor, and successively exposing the optical waveguide to the pulsed light through the interference pattern generator when the optical waveguide and interference pattern are effectively stationary relative to the pulsed light.
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