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发明名称
METHOD FOR FABRICATION OF DEEP CONTACT HOLE IN SEMICONDUCTOR DEVICE
摘要
申请公布号
KR20050116314(A)
申请公布日期
2005.12.12
申请号
KR20040041532
申请日期
2004.06.07
申请人
HYNIX SEMICONDUCTOR INC.
发明人
LEE, SUNG KWON;JUNG, TAE WOO;KIM, YOUNG CHAN
分类号
H01L21/28;(IPC1-7):H01L21/28
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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