发明名称 |
Method of producing substrate having patterned organosilane layer and method of using the substrate having the patterned organosilane layer |
摘要 |
Provided are a method of producing a substrate having a patterned organosilane layer and a method of using the substrate having the patterned organosilane layer. The method of producing the substrate having the patterned organosilane layer, includes: coating organosilane on a substrate to obtain an organosilane layer; coating a photoresist material on the organosilane layer; exposing the photoresist material to light through a mask to obtain a patterned surface on the photoresist material; developing an exposed or unexposed region of the photoresist material using a developer; and wet etching a portion of the organosilane layer in the region from which the photoresist material has been removed, using a HF-containing solution as an etchant.
|
申请公布号 |
US2005272268(A1) |
申请公布日期 |
2005.12.08 |
申请号 |
US20050130756 |
申请日期 |
2005.05.17 |
申请人 |
HWANG KYU-YOUN;NAMGOONG JI-NA;SHIM JEO-YOUNG |
发明人 |
HWANG KYU-YOUN;NAMGOONG JI-NA;SHIM JEO-YOUNG |
分类号 |
H01L27/12;B01J19/00;G01N33/543;H01L21/31;H01L21/469;(IPC1-7):H01L21/469 |
主分类号 |
H01L27/12 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|