发明名称 |
DEVICE AND METHOD FOR ILLUMINATION DOSE ADJUSTMENTS IN MICROLITHOGRAPHY |
摘要 |
A device for adjusting the illumination dose on a photosensitive layer (26), which is applied to a support (28) that can be displaced in a microlithographic projection exposure system (10) in a scanning direction (22) relative to a projection lens (16) of the projection exposure system (10), comprises an arrangement of a plurality of stop elements (52, 52') which are arranged next to one another perpendicularly to the scanning direction (22) and can respectively be displaced individually in the scanning direction (22) into a light field (60) produced by the projection exposure system (10). At least one stop element (52) is partially transparent for the projection light (14) being used in the projection exposure system (10), at least inside a subregion (69). This procedure substantially avoids pulse quantisation effects, which occur when using pulsed light sources (30) and can lead to inhomogeneous illumination of the reticle (20). |
申请公布号 |
WO2005040927(A3) |
申请公布日期 |
2005.12.08 |
申请号 |
WO2004EP10554 |
申请日期 |
2004.09.21 |
申请人 |
CARL ZEISS SMT AG;GRUNER, TORALF;DEGUENTHER, MARKUS |
发明人 |
GRUNER, TORALF;DEGUENTHER, MARKUS |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|