发明名称 METHOD FOR ELECTROPLATING BATH CHEMISTRY CONTROL
摘要 <p>A method for controlling the chemical composition of an electroplating bath solution used to plate a plurality of substrates by providing the electroplating bath solution to a small-volume plating cell configured to minimize additive breakdown, and discarding the electroplating bath after a predetermined bath lifetime. The method includes predetermining a lifetime of an electroplating bath solution having a desired chemical composition, combining a plurality of electroplating bath solution components thereby forming the electroplating bath solution having the desired chemical composition, filling a small-volume plating cell with the electroplating bath solution, plating a plurality of substrates in the electroplating bath solution until the bath lifetime is reached; and discarding the electroplating bath solution after the bath lifetime is reached.</p>
申请公布号 WO2005116303(A1) 申请公布日期 2005.12.08
申请号 WO2005US16123 申请日期 2005.05.06
申请人 APPLIED MATERIALS, INC.;ROSENFELD, ARON;HAFEZI, HOOMAN;SUN, ZHI-WEN;YANG, MICHAEL;BEHNKE, JOSEPH 发明人 ROSENFELD, ARON;HAFEZI, HOOMAN;SUN, ZHI-WEN;YANG, MICHAEL;BEHNKE, JOSEPH
分类号 A23D7/00;A23D7/005;A23D7/01;A23J7/00;C07F9/10;C25D7/12;C25D21/12;C25D21/18;H01L21/288;(IPC1-7):C25D21/12 主分类号 A23D7/00
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