SUBSTRATE TREATMENT APPARATUS, SUBSTRATE TREATMENT METHOD, AND METHOD FOR MANUFACTURING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To suppress a poor influence such as spilling in a developing fluid caused by the influence of a down-flow whose temperature and humidity are controlled in paddle type development. SOLUTION: A substrate treatment apparatus comprises a mechanism 32 for rotatably retaining a substrate W to be treated; a first surrounding body 60 and a second surrounding body 75 for surrounding the substrate W to be treated retained by the substrate retaining mechanism 32; and a developing fluid supply mechanism 90 that travels in parallel with the substrate W to be treated retained by the substrate retaining mechanism 32 from the upper position of the first surrounding body 60 and supplies a developing fluid to the substrate W to be treated. COPYRIGHT: (C)2006,JPO&NCIPI