发明名称 ANNEALING METHOD, CRYSTALIZING METHOD, AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a crystalizing method in which crystal grains of large size can closely be formed with low power at high temperature. SOLUTION: Based upon initial data including at least characteristics of phase-modulated laser light, properties and film thicknesses of cap films, and properties and a film thickness of a film to be crystallized and experimentation, data on correlation between the fluence of incident light of modulated laser light and the film thicknesses of the cap films for state change of a non-single-crystal semiconductor film after irradiation are generated. Based upon the correlation data, film thicknesses of cap films are selected respectively, and the non-single-crystal semiconductor film is irradiated with laser light having selected fluence of the incident light from the side of a cap film having a selected film thickness, fused, and crystallized to laterally grow its crystal grains. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005340373(A) 申请公布日期 2005.12.08
申请号 JP20040154939 申请日期 2004.05.25
申请人 ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO LTD 发明人 OGAWA HIROYUKI;HIRAMATSU MASAHITO;JUMONJI MASAYUKI;KIMURA YOSHINOBU;KATO TOMOYA;TANIGUCHI YUKIO;MATSUMURA MASAKIYO
分类号 H01L21/20;H01L21/336;H01L29/786;(IPC1-7):H01L21/20 主分类号 H01L21/20
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