| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition system capable of increasing the thickness and the scale of a thin film formed on a substrate surface, attaining the uniformization of the components of the thin film, and preventing the increase of a cost without increasing the capacity of a crucible, and to provide a vapor deposition method. SOLUTION: The vapor deposition system comprises the crucible 3, heating equipment for melting the raw material in the crucible 3, and a substrate 15 where the raw material 12 melted by the heating equipment is deposited by evaporation. The crucible 3 is comprised of an outer crucible 4 and an inner crucible 5 formed to shield the melt surface inside the outer crucible 4 and to permit the communication of the melt and a raw material supply mechanism for continuously supplying the raw material 12 at a fixed speed between the outer crucible 4 and the inner side crucible 5. COPYRIGHT: (C)2006,JPO&NCIPI
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