发明名称 Transparent conductive film
摘要 The present invention provides a transparent conductive film having: a transparent base film; a transparent SiO<SUB>x </SUB>thin film having a thickness of from 10 to 100 nm, a refractive index of from 1.40 to 1.80 and an average surface roughness Ra of from 0.8 to 3.0 nm, wherein x is from 1.0 to 2.0; and a transparent conductive thin film including an indium-tin complex oxide, which has a thickness of from 20 to 35 nm and a ratio of SnO<SUB>2</SUB>/(In<SUB>2</SUB>O<SUB>3</SUB>+SnO<SUB>2</SUB>) of from 3 to 15 wt %, wherein the transparent conductive thin film is disposed on one side of the transparent base film through the transparent SiO<SUB>x </SUB>thin film.
申请公布号 US2005269707(A1) 申请公布日期 2005.12.08
申请号 US20050141009 申请日期 2005.06.01
申请人 NITTO DENKO CORPORATION 发明人 NASHIKI TOMOTAKE;SUGAWARA HIDEO
分类号 H01L21/4763;H01L23/48;(IPC1-7):H01L23/48;H01L21/476 主分类号 H01L21/4763
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