| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning device and a cleaning method for efficiently cleaning a substrate. SOLUTION: The cleaning device comprises a retaining member 20 for retaining the substrate W; a first liquid supply mechanism 30 for partially injecting liquid to the surface of the substrate W retained by the retaining member 20 and scans the entire surface of the substrate W for cleaning the surface of the substrate W; and a second liquid supply mechanism 40 for supplying liquid toward the entire surface of the substrate W retained by the retaining member 20. COPYRIGHT: (C)2006,JPO&NCIPI
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