发明名称 Wiring board and production method thereof, and semiconductor apparatus
摘要 Provided is a wiring board and production method thereof, wherein production of wiring by a full additive method is achieved. This is extremely useful in forming fine copper wiring featuring a high adhesion on an insulating resin substrate. A resin having an excellent alkali resistance is used as the insulating resin substrate, and the copper wiring is formed on the insulating resin substrate through a degenerated layer containing amide group and a metallic oxide layer of a metal having a reduction potential more base than that of copper. The degenerated layer can be provided by, e.g., introduction of amide group into the surface of the insulating resin substrate. The copper can be formed by processes including electroless plating. The insulating resin substrate has superb heat resistance and dimensional stability, and the formed structure can provide a highly packed wiring board.
申请公布号 US2005271828(A1) 申请公布日期 2005.12.08
申请号 US20050185897 申请日期 2005.07.21
申请人 SAITO TOSHIRO;AKAHOSHI HARUO;ITABASHI TAKEYUKI 发明人 SAITO TOSHIRO;AKAHOSHI HARUO;ITABASHI TAKEYUKI
分类号 H05K3/18;H01L21/48;H05H1/00;H05K1/03;H05K3/38;H05K3/46;(IPC1-7):H05H1/00 主分类号 H05K3/18
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