| 摘要 |
This invention relates to a mask cleaning apparatus (101) and a method of cleaning a mask substrate (110). An embodiment according to the invention is a mask cleaning apparatus (101) with a trap comprising a cold trap (120). An additional heater (130) performs the heating function. The mask cleaning apparatus (101) further comprises a support means (105), an aerosol nozzle (150) for blowing aerosol (155) towards the mask substrate (110). In a first stage of the cleaning process the mask substrate (110) is close to the heater (130), and the mask substrate (110) is heated. In a second stage of the cleaning process, the gas flow (170) is stopped, and the mask (110) is transported close to the cold trap (120). The cold trap (120) is cooled. In a third stage of the cleaning process, the aerosol nozzle (150) blows aerosol (155) towards the mask substrate (110), causing particles to become detached from the mask substrate (110). This embodiment uses thermophoretic forces for trapping detached particles. Other embodiments according to the invention use vacuum, electrostatic forces and/or getter metal for trapping detached particles. |
