发明名称 METHOD AND DEVICE FOR MANUFACTURING SUBSTRATE FOR BIOCHIP, AND MANUFACTURED BIOCHIP
摘要 PROBLEM TO BE SOLVED: To provide (1) a method and device for manufacturing a substrate for a biochip capable of preventing a metal film from being separated in an assay solution, without using a substrate film such as chromium, (2) a surface plasmon measuring substrate having a metal film uniform with precision in an order of 1nm, and capable of preventing the metal film from being separated in the assay solution, and (3) a gold single crystal substrate for a scanning type probe microscope precluded from being separated in the assay solution. SOLUTION: In this manufacturing method for the gold substrate for the biochip, gold is vapor-deposited on a plasma-treated face of a substrate under a vacuum condition to form a gold thin film, after plasma-treating a surface of the substrate under the vacuum condition. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005337930(A) 申请公布日期 2005.12.08
申请号 JP20040158287 申请日期 2004.05.27
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY;R-DEC CO LTD;BIEMTRON:KK 发明人 TAMADA KAORU;SASAKI TOMOAKI;SATO TATSUSHI
分类号 G01N33/553;C12N15/09;G01N33/53;G01N33/543;G01N33/552;G01N37/00;(IPC1-7):G01N33/553 主分类号 G01N33/553
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