| 摘要 |
PROBLEM TO BE SOLVED: To provide a thinner composition for removing a photoresist, the composition which is used for a glass substrate to be used for a liquid crystal display and for the peripheral edge and the back face of a wafer to be used for the manufacture of a semiconductor so that a photoresist as unnecessary depositing can be efficiently removed in a short period of time. SOLUTION: The thinner composition for removing a photoresist contains (a) alkyl amide and (b) alkyl ethanoate. Preferably, the thinner composition contains (a) 1 to 99 parts by weight of alkyl amide and (b) 1 to 80 parts by weight of alkyl ethanoate. In the method for manufacturing a semiconductor device or a liquid crystal display, the above thinner composition is used. COPYRIGHT: (C)2006,JPO&NCIPI |
