| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma film deposition system for a hollow vessel where a matching unit for matching impedance in a plasma CVD (Chemical Vapor Deposition) system using a metallic vessel for sealing microwave energy is miniaturized, and further, impedance matching operation at the time of changing a production line can be simplified as well. SOLUTION: The plasma film deposition system for a hollow vessel is provided with a means where a hollow vessel is held to a metallic vessel, and the metallic vessel is made into a vacuum; and a means where plasma is generated inside the metallic vessel, and a matching unit for matching impedance via a rectangular wave guide between the microwave oscillator for generating plasma and the metallic vessel is a wave guide opening area control type matching unit. COPYRIGHT: (C)2006,JPO&NCIPI
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