LASER MULTIPLEXING

摘要

A laser multiplexing system and method for use with high power pulsed lasers in Extreme Ultraviolet Lithography i.e. EUL. In a first embodiment, a high power EUV laser multiplexing element (200) for laser produced plasma generation comprises a compound lens comprising at least two focusing elements (210) arranged to focus at least two respective laser beams (208) to a focal point (204) on a common workpiece. In a second embodiment, a laser multiplexing apparatus comprises at least two pulsed laser sources for generating pulsed laser beams and a temporal multiplexing element (302) arranged to temporally interleave at least two pulsed laser beams (300). In a third embodiment, laser multiplexing assembly comprises a beam shaping element (401) in which the beam shaping element is arranged to direct a first laser beam (406a) along an axis common with a second laser beam (406b) axis onto a common focussing element (405) arranges about said common axis.