| 摘要 |
A water soluble resin composition comprising at least a water soluble resin, an acid generator capable of generating an acid when heated and a solvent containing water. This water soluble resin composition is applied onto highly water repellent resist pattern (3), the resist pattern (3) formed from, for example, an ArF responsive radiation-sensitive resin composition, thereby providing coating layer (4). Thereafter, by heating, developer-insoluble modified layer (5) is formed on the surface of resist pattern (3). By developing the coating layer (4), there results a resist pattern thickened by the modified layer (5). This modified layer can be formed with not only a satisfactory thickness but also a favorable dimension controlling capability with respect to the resist pattern from ArF responsive radiation-sensitive resin composition. As a result, the resist pattern spacing size and hole opening size can be effectively reduced to limiting resolution or below. Further, this modified layer (5) also acts as a protective film for resist pattern when irradiated with electron beams, so that at the irradiation with electron beams of length measuring SEM, measured length variations for the resist pattern can be prevented.
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