| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which is excellent in performances such as sensitivity transmittance, insulation and chemical resistance, remarkably improves flatness and coating property in particular, and is suitable for forming an interlayer insulating film in a process for fabricating LCD, etc. <P>SOLUTION: The photosensitive resin composition comprises (a) an acrylic copolymer obtained by copolymerizing (i) an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride or a mixture of them, (ii) an epoxy-containing unsaturated compound and (iii) an olefinically unsaturated compound, (b) a 1,2-quinonediazido compound and (c) one or more solvents selected from the group consisting of benzyl alcohol, hexyl alcohol, diethylene glycol dimethyl ether, diethylene glycol methylethyl ether, diethylene glycol diethyl ether, dipropylene glycol diethyl ether, dipropylene glycol dimethyl ether and dipropylene glycol methylethyl ether. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
