| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for polishing a color filter for a liquid crystal display apparatus, by which polishing grains left in a resin black matrix in polishing processing for the surface of a color filter can be reduced and the strength of sticking between the resin black matrix and a seal material in a seal part S can be improved. <P>SOLUTION: The polishing processing is performed by using a polishing solution having a pH value capable of negatively charging the surface of polishing grains. The polishing grains are α-Al<SB>2</SB>O<SB>3</SB>and the pH value is ≥9.0. When the polishing grains are SiO<SB>2</SB>, the pH value is ≥6.0. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
