| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography device having a gas flushing device. <P>SOLUTION: The lithography device includes a lighting system which supplies projection beams, and a support structure which supports a patterning device useful for supplying beams having a pattern in the section thereof. The lithography device also has a gas flushing device which flushes a practically layered gas flow across the projection beams and/or along the surface of optical components and includes a single gas exit having an inner rim on the downstream end thereof. The inner rim demarcates the entire area of the gas exit, which is equipped with a laminator having an effective area where the layered gas flow practically comes out therefrom when the gas is used. The effective area of the laminator has a laminator opening and includes a material at least having the same size as the entire area of the gas exit. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
