发明名称 ArF EXCIMER LASER APPARATUS
摘要 PROBLEM TO BE SOLVED: To ensure stabilized pulse energy by restraining the lowering of the pulse energy at high repetition frequency (e.g., 4,000 Hz) in an ArF excimer laser apparatus. SOLUTION: Ozone O<SB>3</SB>, HO<SB>2</SB>, H<SB>2</SB>O<SB>2</SB>produced in a discharge space 120 and in the vicinity of the same go along a circulation flow passage 200 and again returns to the discharge space 120. Either of ozone O<SB>3</SB>, HO<SB>2</SB>, H<SB>2</SB>O<SB>2</SB>produced during that time is thermally decomposed. Further, ultraviolet light is irradiated to either of ozone O<SB>3</SB>, HO<SB>2</SB>, H<SB>2</SB>O<SB>2</SB>produced in the discharge space 120 and in the vicinity of the same, during the time ozone O<SB>3</SB>, HO<SB>2</SB>, H<SB>2</SB>O<SB>2</SB>go along the circulation flow passage 200 and again return to the discharge space 120. Consequently, either of ozone O<SB>3</SB>, HO<SB>2</SB>, H<SB>2</SB>O<SB>2</SB>is decomposed. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005340363(A) 申请公布日期 2005.12.08
申请号 JP20040154858 申请日期 2004.05.25
申请人 KYUSHU UNIV;USHIO INC;KOMATSU LTD 发明人 UCHINO KIICHIRO;ISHIHARA TAKANOBU;SUMIYA AKIRA;WAKABAYASHI OSAMU
分类号 H01S3/134;H01S3/036;(IPC1-7):H01S3/134 主分类号 H01S3/134
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