| 发明名称 |
System and method for improvement of alignment and overlay for microlithography |
| 摘要 |
The present invention provides a method for determining the forces to be applied to a substrate in order to deform the same and correct for overlay misalignment.
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| 申请公布号 |
US2005271955(A1) |
申请公布日期 |
2005.12.08 |
| 申请号 |
US20050143076 |
申请日期 |
2005.06.02 |
| 申请人 |
BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM |
发明人 |
CHERALA ANSHUMAN;SREENIVASAN SIDLGATA V.;ADUSUMILLI KRANTHIMITRA |
| 分类号 |
G03F7/20;G03F9/00;(IPC1-7):G03F9/00 |
主分类号 |
G03F7/20 |
| 代理机构 |
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