| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To solve the following problem; when a resist coated product is exposed with an aligner or the like, a glass mask and the product adhere to each other, therefore it is necessary to expose the product at a certain interval between the mask and the resist or through a film interposed between those, and in the case of exposure of a line width of≤10μm line-and-space, a circuit with a good pattern cannot be formed because high accuracy is not achieved. <P>SOLUTION: In order to accurately expose an insulating film and a resist film for plating of a circuit pattern on a semiconductor wafer, a glass mask for exposure which does not adhere to a product even under contact and processing therefor are provided as follows; a surface of a glass mask for exposure of a circuit is thinly coated with a paraffin wax or a microcrystalline wax, whereby the glass mask does not adhere to a resist coated product even when the glass mask is brought into direct contact with the product. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
