发明名称 METHOD OF ADJUSTING CONSTITUENTS OF LIQUID AND CMP POLISHING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a method of adjusting constituents of a liquid such as a washing liquid correctly without wasting much of the liquid. SOLUTION: A constituent controller 4 adjusts the constituents of the liquid in batch. First, it is checked if facility to be used is in operation or not. When the facility is in operation, undiluted solution is supplemented at regular intervals of time. At that time, constituent values of the liquid is inputted from a constituent measuring apparatus 5, and based on the values, a quantity of supplement of the undiluted solution is determined. When the facility is not in operation, only the constituents of the liquid among ones measured by the constituent measuring apparatus 5 which are less than the targeted values are supplemented to adjust the constituents. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005340313(A) 申请公布日期 2005.12.08
申请号 JP20040154068 申请日期 2004.05.25
申请人 NIKON CORP 发明人 SANADA SATORU;ARAI HIROSHI
分类号 H01L21/304;(IPC1-7):H01L21/304 主分类号 H01L21/304
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