发明名称 TARGET FOR SPUTTERING, ITS PRODUCTION METHOD AND HIGH MELTING POINT METAL POWDER MATERIAL
摘要 PROBLEM TO BE SOLVED: To establish a method for producing high melting point metal powder having high purity and excellent formability, particularly spherical metal powder composed of Ta, Ru or the like having a melting point higher than that of iron, and to produce a target of high melting point metal and the alloy thereof having a chemical composition of high purity and low oxygen, and having high density and a fine and uniform structure as well by subjecting the above powder to pressure sintering. SOLUTION: A powder material essentially consisting of a high melting point metal material is introduced into thermal plasma with gaseous hydrogen introduced, thus is refined and spheroidized. Further, the obtained powder is subjected to pressure sintering by hot hydrostatic pressing or the like. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005336617(A) 申请公布日期 2005.12.08
申请号 JP20050157486 申请日期 2005.05.30
申请人 HITACHI METALS LTD 发明人 KAN TAKESHI;MURATA HIDEO;NAKAMURA HIDEKI
分类号 C22B9/22;B22F1/00;B22F3/15;C22B34/24;C22B61/00;C22C1/04;C22C5/04;C22C27/02;C23C14/34;H01L21/285;(IPC1-7):C23C14/34 主分类号 C22B9/22
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