UV RADIATION BLOCKING PROTECTIVE LAYERS COMPATIBLE WITH THICK FILM PASTES

摘要

This invention relates to compositions comprising a photoresist material and a UV-B blocking agent. These compositions are used in the fabrication of electronic devices, particularly those formed from thick film pastes. The present invention is also an electronic device fabrication process using the compositions. A protective polymer layer is fabricated from materials that are insoluble after irradiation in the ester-type solvents contained in a thick film paste. By appropriate selection of protective film polymers, the protective film can be used to photo-image a pattern with an unfiltered mercury lamp radiation source.