RESIN FOR RESIST COMPOSITION, NEGATIVE TYPE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a technique for suppressing swelling of a resist pattern.

SOLUTION: A negative type resist composition is obtained by using a resin for the resist composition having a constituent unit (a1) containing an alicyclic group having a fluorinated hydroxyalkyl group and a constituent unit (a2) derived from an acrylic ester and containing a hydroxy group-containing alicyclic group. The resist pattern is formed by using the resist composition.

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