| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a reticle illuminating field capable of illuminating only a specific portion, in order to reduce the loss of illumination energy, in a lithographic apparatus using a reticle having a plurality of patterns. <P>SOLUTION: The illumination system comprises a field defining element arranged to define an illuminating field in the plane of the patterning device or in a plane conjugate to it, the field being off-axis with respect to the optical axis of the illuminating system. One selected from a set of the field defining elements can be arranged to the illumination system through a replacing mechanism. The two-dimensional array of small lens or a holographic element can be used for the field defining element. The illumination system, in addition, may include a diffraction optical element for receiving an illuminating radiation, zoom lens, condensing lens, and relay lens. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
